† Corresponding author. E-mail:
Project supported by the National Natural Science Foundation of China (Grant Nos. 51525202, 61505051, 1137049, 61474040, and 61635001), the Aid Program for Science and Technology Innovative Research Team in Higher Educational Institutions of Hunan Province, China, and the Fundamental Research Funds for the Central Universities, China.
Bandgap engineering of semiconductor nanomaterials is critical for their applications in nanoelectronics, optoelectronics, and photonics. Here we report, for the first time, the growth of single-crystalline quaternary alloyed Ga0.75In0.25As0.49Sb0.51 nanowires via a chemical-vapor-deposition method. The synthesized nanowires have a uniform composition distribution along the growth direction, with a zinc-blende structure. In the photoluminescence investigation, these quaternary alloyed semiconductor nanowires show a strong band edge light emission at 1950 nm (0.636 eV). Photodetectors based on these alloy nanowires show a strong light response in the near-infrared region (980 nm) with the external quantum efficiency of 2.0 × 104% and the responsivity of 158 A/W. These novel near-infrared photodetectors may find promising applications in integrated infrared photodetection, information communication, and processing.
One-dimensional semiconductor nanowires have attracted considerable attention as unique building blocks for various applications in integrated electronic and optoelectronic devices, such as nanoscale lasers,[1–3] field effect transistors,[4–6] solar cells,[7] and photodetectors (PDs).[8,9] Nanowire-based PDs, as potential key functional units in on-chip information communication and processing, have attracted considerable interest.[10–12] Particularly, PDs constructed by III–V semiconductor nanowires are widely used in near-infrared and infrared detection due to their narrow bandgap.[13,14] Compared to the binary III–V semiconductor nanowires, the alloyed III–V semiconductor wires usually have wider and adjustable spectral response ranges due to their tunable bandgap nature, which means that the III–V alloy nanowires are ideal systems that are promising candidates for constructing wide-spectral-response-range and high-performance PDs in the infrared region.[15–21] Among the many III–V alloys, Ga1−xInxAsySb1−y is an important quaternary alloy with tunable bandgap from 1.42 eV (x = 0, y = 1) to 0.1 eV (x = 1, y = 0), this widely tunable bandgap range covers three important spectral regions 1–3 μm, 3–5 μm, and 8–14 μm.[22] So far, GaInAsSb layers based PDs have been successfully constructed,[23,24] however, the photoelectric measurement based on quaternary GaInAsSb alloy nanowires is rarely reported in the literature.
Quaternary Ga1−xInxAsySb1−y alloys have usually been grown by liquid phase epitaxy (LPE),[25] organometallic vapor phase epitaxy (MOVPE),[26] molecular beam epitaxy (MBE),[27] and metal-organic chemical-vapor-deposition (MOCVD).[28] For the preparation of GaInAsSb quaternary alloy nanowires, there is a challenge to obtain the GaInAsSb nanowires with compositions in the miscibility gap through LPE or other thermodynamic equilibrium methods. Although, the non-equilibrium growth techniques, such as MBE and MOCVD, can effectively overcome this difficulty, the above growth strategies usually have a high cost and the preparation process is complicated. To the best of our knowledge, there is no report on the GaInAsSb alloy nanowires synthesized via a chemical vapor deposition (CVD) method, which is a cheaper method and easy to operate.
In this work, high-quality GaInAsSb quaternary alloyed nanowires were synthesized via a simple CVD method. Both Raman spectrum and photoluminescence studies show bandgap engineered optical properties consistent with the composition of the alloy nanowires. Single-nanowire-PDs with high responsivity and external quantum efficiency in the near-infrared region were constructed. Our results of these novel PDs will advance the development of photonics and optoelectronics as well as the integrated devices.
The samples were grown in a horizontal furnace, where a moving source method was applied for the composition modulation.[29] Typically, an alumina boat with GaSb powder (Aladdin, 99.99%) was firstly pulled into the heating zone of the furnace, and another boat with InAs powder (Aladdin, 99.99%) was placed far away from the heating zone. A quartz rod driven by a step motor through magnetic force was used to push the boats into or out of the heating zone during the growth. Silicon wafers coated with 5-nm-thick gold film were placed in the deposition area to collect the samples. Before heating, mixed gas (Ar with 5% H2) was flowed into the system at a rate of 45 sccm and the pressure was maintained at 4 Torr. Then the furnace was heated to 750 °C at a rate of 30 °C·min−1. After 60 min of growth at 750 °C, the InAs powder was shifted to the center of the heating zone slowly. After keeping on the growth for another 60 min, the furnace was naturally cooled to room temperature.
The morphology and structure of the as-prepared sample were characterized by a field emission scanning electron microscope (FE-SEM, Zeiss sigma-HD), an x-ray diffraction spectrometer (XRD, Rigaku D/Max 2500), and a transmissionelectron microscope (TEM, Tecai F20) combined with energy-dispersive x-ray spectroscopy (EDX). The Raman scattering spectra were collected on a laser confocal Raman spectrometer (LABRAM-010, France), while PL measurements were conducted via a home-built infrared micro-PL setup with a femtosecond laser excitation source (Spectra Physics Tsunami, 800 nm, 80 fs pulse duration, 80 MHz repetition rate).
PDs were constructed with the as-prepared single Ga0.75In0.25As0.49Sb0.51 nanowires. The nanowires were first dispersed on a p-type Si substrate with a 300 nm thickness SiO2 layer. Then AMMA and PMMA were spin-coated on the surface of the mask. The electron-beam lithography system (RAITH: 150-TWO) was employed to design the electrode patterns. Two Cr/Au (10/60 nm) electrodes that acted as the source and drain were fabricated by a thermally deposited process. The single nanowire connected with the Cr/Au Schottky contact electrodes constitutes a typical M-S-M PD. The as-fabricated PDs were investigated by a semiconductor parameter analyzer (Keithley 4200) under dark conditions and the illumination of a monochromatic light beam, all the measurements were carried out at room temperature.
The SEM image of the as-grown sample (Fig.
Figure
In order to further characterize the microstructural properties of the as-grown Ga0.75In0.25As0.49Sb0.51 nanowires, we have performed the Raman and PL spectra measurements. As displayed in Fig.
In order to investigate the photoresponse properties of the as-grown nanowires, PDs were constructed with the as-prepared single Ga0.75In0.25As0.49Sb0.51 nanowires. The single nanowire connected with the Cr/Au Schottky contact electrodes constitutes a typical M-S-M PD. Figure
The spectral responsivity (R) and external quantum efficiency (EQE) are two critical parameters of a PD, which can be expressed as[34,35]
In summary, the Ga0.75In0.25As0.49Sb0.51 quaternary alloy nanowires have been successfully synthesized through a simple CVD method. Along the length of the nanowires, the composition distribution of the nanowires is uniform, and the nanowires are high quality zinc-blende single-crystal structured. These nanowires have strong light emission at 1950 nm, which is in accordance with their bandedge emission. The constructed PDs based on the alloy nanowires show a strong light response in the near-infrared region with high R (158 A/W) and EQE (2.0 × 104%). The synthesized quaternary alloy nanowires in this work will be a good candidate for construction of functional electronic and photoelectric devices.
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